In the processing of semi-conductors, one important step is the overlaying of the components with not one but many layers of materials. They must be deposited on top of the substrate of the semiconductor to build-up the IC component. This process is thin film deposition. It requires the overlapping of such things as transistor gates with several coatings of thin film materials to obtain the desired result.
Thin Film Materials: Qualities
Thin film materials can be comprised of any of several metals. The same applies for the substrates. In fact, there is a direct co-relation between the two. The substrate material is a key component in the mechanical properties of single and multi-layered thin film deposition results. In fact, there is no one type nor characteristic of any thin film material. It is all a matter of individual selection.
Selecting Thin Film Materials
As noted above, thin film materials is a blanket term that can include a vast array of materials used for overlaying a substrate. This indicates the importance of selecting the right material for deposition. When choosing one, you need to consider:
* The class of product to be covered
* The type of material e.g. tin oxide, tantalum oxide or nichrome
* The properties of the material
* The dimension of the product
* The features desired or required by the client
These are all important considerations for the selection of the right materials for the process of thin film deposition.
Thin Film Deposition
Thin film materials are part of the process of thin film deposition. This refers to almost any technique that places layers of thin film of material on an existing substrate. It is also the name given to the overlaying of such material on layers of material that have been deposited previously on the substrate. The term “thin” is applied only if the layers are of the minutest. In order for the layer to be “thin,” it must be nano, micro or similarly infinitesimally small in scale.
The actual deposition process differs according to the company and/or the client. The two most common methods of thin film deposition are:
1. Physical vapor deposition (PVD)
2. Chemical vapor deposition (CVD)
Both methods have their advantages and disadvantages.
Thin Film Materials
Thin film deposition finds its ideal niche in the manufacturing of precise instrumentation for both the electronic and optical industries. Semi-conductors are a perfect example of the application of thin film material to achieve the desired goal. With its adaptability and diversity, thin film materials are ideal for successful application in these categories where precision coating always counts.
